Our Products
Pioneering radical cleaning methods for research.
UV Cleaning
Harnessing UV light to purify delicate samples.
UV LED array of 250~450nm
High photon intensity, ~200W/cm2
Heat sink to protect UV chips
Ozone Oxidation
Using ozone to remove contaminants efficiently.
Low power consumption, high ozone concentration
Ozone storage reservoir for pulsed release
Pressure ajustment to control feed
Plasma Touch
Applying plasma for thorough sample cleaning.
Microwave plasma for high pressure usage
Uniform distribution
Reduced blastic etching
Remote thermal activation
Expert on thermal radical cleaning methods.
Metallic reflection mirror
Intensive thermal activation, 60~120W/cm2
>80% radiation in IR band
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Contact our tech personel for instruments you need
Gallery View
Snapshots of our radical cleaning instruments in action.
Our Services
Cutting-edge cleaning tools and expert consulting for research labs.
Instruments
Radical cleaning tools using UV, ozone, and plasma to prep your samples.
Consulting
Tailored advice on radical cleaning methods to boost your research results.