Our Products

Pioneering radical cleaning methods for research.

UV Cleaning

Harnessing UV light to purify delicate samples.

• UV LED array of 250~450nm

• High photon intensity, ~200W/cm2

• Heat sink to protect UV chips

• Customerizable upon requests

Ozone Oxidation

Using ozone to remove contaminants efficiently.

• Low power consumption, high ozone concentration

• Ozone storage reservoir for pulsed release

• 0.1~10slm feed flow. Pressure ajustment to control feed

• 5%~15% wt%/O3 at 1slm pure oxygen flow, depending on models

• Customerizable upon request

Plasma Touch

Applying plasma for thorough sample cleaning.

• Microwave plasma for high pressure usage

• Uniform distribution

• Reduced blastic etching

• Customerizable upon request

Remote thermal activation

Expert on thermal radical cleaning methods.

• Metallic reflection mirror

• Intensive thermal activation, 60~120W/cm2

• >80% radiation in IR band

• Customerizable upon request

→

Contact our tech personel for instruments you need